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铬溅射靶
Chromium sputtering target
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| 产品编号 | 包装单位 | 单价(元) | 国内现货 | 国外库存 | 询价单 |
| 3064128 | 1each | 5370 |
产品别名
7440-47-3
铬溅射靶
Chromium sputtering target
基本信息
| 应用 | Chromium sputtering target is commonly used for thin-film deposition, etching and analytical techniques. And It is also used as Magnetron sputtering source. |
| 备注 | Thickness tolerance: ^+0.015in; Diameter tolerance: +0.020/-0.0in |
| MDL | MFCD00010944 |
| EINECS | 231-157-5 |
| 灵敏度 | Ambient temperatures. |
| 溶解性 | Insoluble in water. |
安全信息
| TSCA | 是 |
